Figures

Figure 1:Reduced magnetization (M/M_S) vs. applied field (H) along the [110] direction for (a) biased NiO/NiFe bilayer and (b) a free NiFe thin film. (84K)

Figure 2: Surface steps revealed in reflected light on MgO/NiO/NiFe and (b) birefringence picture of the same sample region. (186K)

Figure 3: MOIF images of the same sample region during the [110] unidirectional-axis remagnetization in the MgO(001)/NiO/NiFe sample. Applied field µ₀H = -3.0 (a), +1.6 (b), -6.2 (c), and -6.4 mT (d). Arrows (here and in the following figures) indicate the local magnetization direction. (768K)

Figure 4: MOIF images of microdomains localized on the edge dislocation slip planes in the same region of the MgO/NiO/NiFe sample. Applied field µ₀H = +3 mT (a), +4.2 (b) and +6.9 (c). (160K)

Figure 5: MOIF images of the [100] unidirectional axis magnetization reversal in the MgO(001)/NiO/NiFe sample: (a) µ₀H = -4.2 mT and (b) µ₀H = +1.5 mT. (177K)

Figure 6: MOIF images of the [110] easy-axis magnetization reversal in the MgO(001)/NiFe sample. (242K)

Figure 7: MOIF images of the magnetization reversal in (a) polycrystalline Si/NiO/NiFe and (b) polycrystalline Si/NiFe films. (208K)